Method and apparatus for temperature change and control

ABSTRACT

An apparatus for controlling the temperature of a substrate which includes a substrate table and a thermal assembly arranged in the substrate table and in thermal communication with a thermal surface of the substrate table. The thermal assembly includes a channel that carries a heat-transfer fluid. The apparatus further includes a fluid thermal unit which includes a first fluid unit configured to control the temperature of the heat-transfer fluid to a first temperature, a second fluid unit configured to control the temperature of the heat-transfer fluid to a second temperature, and an outlet flow control unit that is in fluid communication with the channel of the thermal assembly and the first and second fluid units. The outlet flow control unit is configured to supply the channel with a controlled heat transfer fluid, which includes at least one of the heat-transfer fluid having a first temperature, the heat transfer fluid having a second temperature or a combination thereof.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of and claims the benefit of priorityunder 35 U.S.C. §120 from U.S. Ser. No. 10/824,643, filed Apr. 15, 2004;the content of this application is herein incorporated by reference inits entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to an apparatus and a method for controlling thetemperature of a substrate. More particularly, this invention relates toan apparatus and a method for performing temperature change andtemperature control of a substrate.

2. Description of Related Art

The demand for increasing throughput in semiconductors, displays andother types of substrate manufacturing is never-ending. In thesemiconductor technology, for example, due to significant capital andoperating expenses, even small improvements in the equipment or in themethods of using the equipment can lead to a significant financialadvantage.

Many of the processes in substrate processing involve placing thesubstrate, such as a semiconductor wafer, on a substrate table of aprocessing system and processing the substrate. These processesgenerally include chemical processes, plasma induced processes, andetching and deposition processes, and depend on the temperature of thesubstrate.

SUMMARY OF THE INVENTION

According to an aspect of the invention, there is provided an apparatusfor controlling a temperature of a substrate, the substrate having alower surface and an upper surface on which a substrate processing isperformed. In an embodiment of the invention, the apparatus includes asubstrate table having a thermal surface supporting the substrate lowersurface and a thermal assembly arranged in the substrate table and inthermal communication with the thermal surface. The thermal assemblyincludes a channel that carries a heat-transfer fluid. The apparatusfurther includes a fluid thermal unit which includes a first fluid unitconstructed and arranged to control the temperature of the heat-transferfluid to a first temperature, a second fluid unit constructed andarranged to control the temperature of the heat transfer fluid to asecond temperature, and an outlet flow control unit that is in fluidcommunication with the channel of the thermal assembly and the first andsecond fluid units. In this apparatus, the outlet flow control unit isconstructed and arranged to supply the channel with a controlled heattransfer fluid, which includes at least one of the heat-transfer fluidhaving a first temperature, the heat transfer fluid having a secondtemperature or a combination thereof.

According to another aspect of the invention, there is provided adistributed temperature control system for controlling a temperature ofa plurality of equipment, each of the plurality of equipment having achannel that carries a heat-transfer fluid. In an embodiment of theinvention, the system includes a fluid thermal unit constructed andarranged to adjust a temperature of the heat-transfer fluid in each ofthe plurality of equipment. In this system, the thermal unit includes afirst fluid unit constructed and arranged to control the temperature ofthe heat-transfer fluid to a first temperature, a second fluid unitconstructed and arranged to control the temperature of the heat transferfluid to a second temperature, and an outlet flow control unit that isin fluid communication with the channel of each of the plurality ofequipment and the first and second fluid units. The outlet flow controlunit of the thermal assembly is constructed and arranged to supply thechannel of each of the plurality of equipment with the controlled heattransfer fluid, which includes at least one of the heat-transfer fluidhaving a first temperature, the heat transfer fluid having a secondtemperature or a combination thereof.

According to yet another aspect of the invention, there is provided amethod of controlling a temperature of a substrate supported by athermal surface of a substrate table, the substrate table including afluid thermal assembly in thermal communication with the thermalsurface. In an embodiment of the invention, the method includesadjusting a heat-transfer fluid of a first source of heat-transfer fluidto a first temperature and adjusting a heat-transfer fluid of a secondsource of heat-transfer fluid to a second temperature. The methodfurther includes supplying the fluid thermal assembly with a controlledheat-transfer fluid including the heat-transfer fluid from the firstsource of heat-transfer fluid or the heat-transfer fluid from the secondsource of heat-transfer fluid or a combination thereof.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features of the present invention will be describedin conjunction with the accompanying drawings in which:

FIG. 1 is a cross sectional representation of an apparatus according toan embodiment of the invention;

FIG. 2 is a cross-sectional representation of an apparatus according toan embodiment of the invention;

FIG. 3 is a cross-sectional representation of an apparatus according toan embodiment of the invention;

FIG. 4 is a cross-sectional representation of an apparatus according toan embodiment of the invention;

FIG. 5 is a schematic representation of a substrate processing systemaccording to an embodiment of the invention;

FIG. 6 is a top view of the channel embedded in the substrate tableaccording to an embodiment of the invention;

FIG. 7 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention;

FIG. 8 is a schematic representation of the first and the second fluidunits according to an embodiment of the invention;

FIG. 9 is a schematic representation of the first and the second fluidunits according to an embodiment of the invention;

FIG. 10 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention;

FIG. 11 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention;

FIG. 12 is a schematic representation of an outlet flow control unitaccording to an embodiment of the invention;

FIG. 13 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention;

FIG. 14 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention;

FIG. 15 is a schematic representation of a fluid thermal unit accordingto an embodiment of the invention; and

FIG. 16 is a schematic representation of a distributed temperaturecontrol system according to an embodiment of the invention.

DETAILED DESCRIPTION OF SEVERAL EMBODIMENTS OF THE INVENTION

In the following description, in order to facilitate a thoroughunderstanding of the invention and for purposes of explanation and notlimitation, specific details are set forth, such as a particulargeometry of the substrate table and various elements arranged in thesubstrate table. However, it should be understood that the invention maybe practiced in other embodiments that depart from these specificdetails.

The present invention provides an apparatus and a method for temperaturechange and temperature control of any type of equipment, including thatused for materials processing, such as etching or deposition. Moreparticularly, the apparatus and the method may be used, in an embodimentof the invention, for temperature change and control of the thermal partor upper body of a substrate table on which a substrate is disposed.

FIG. 1 is a simplified representation of an apparatus according to anembodiment of the invention. In this embodiment of the invention,apparatus 100 includes block 101, thermal assembly 102 and fluid thermalunit 103. Block 101 represents any part of an equipment that has to becooled or heated such as, for example, a substrate holder. As can beseen in FIG. 1, thermal assembly 102 is arranged in block 101 andincludes channel 104 that carries a heat-transfer fluid 105. Channel 104is in fluid communication with fluid thermal unit 103 through conduits106 and 107. In the embodiment of the invention represented in FIG. 1,fluid thermal unit 103 is constructed and arranged to supply channel 104with a controlled heat-transfer fluid having a desired temperature. InFIG. 1, thermal assembly 102 is in thermal communication with a thermalsurface 108 of block 101 and is positioned within block 101 such thatcontrol of the temperature of thermal surface can be performed. In theembodiment of the present invention shown in FIG. 1, heating or coolingof the thermal surface 108 is by direct thermal conduction, from theheat-transfer fluid to the thermal surface 108, via channel 104 andthermal assembly 102.

FIG. 2 represents an apparatus for controlling a temperature of asubstrate according to an embodiment of the invention. In FIG. 2,apparatus 200 includes a substrate table 201 on which a substrate 209 isdisposed. Apparatus 200 also includes a thermal assembly 202 that isconfigured to control the temperature of the thermal surface 208 ofsubstrate table 201. Apparatus 200 further includes an electrode 210configured to electrostatically clamp substrate 209 on thermal surface208 during substrate processing. In this embodiment of the invention, abackside flow, such as helium, is provided to enhance the thermalconductivity between substrate table 201 and substrate 209. The actualdistance between substrate 209 and substrate table 201 may be verysmall, e.g. in a micron range, in an embodiment of the invention.

Referring now to FIG. 3, this figure illustrates an apparatus forcontrolling a temperature of a substrate according to an embodiment ofthe invention. In this embodiment of the invention, RF power is applieddirectly to the upper body of the substrate table 301. As can be seen inFIG. 3, apparatus 300 includes thermal assembly 302 and second thermalassembly 311 that is in thermal communication with the thermal surface308. In the embodiment of the invention represented in FIG. 3, secondthermal assembly includes a plurality of thermoelectric modules 315 suchas, for example, Peltier devices, which are configured to quickly changethe temperature of thermal surface 308. Thermal assembly 302 is arrangedin substrate table 301 and includes channel 304 that carries aheat-transfer fluid. Apparatus 300 also includes an electrode 310 thatis configured to electrostatically clamp the substrate 309 duringsubstrate processing. A flow of gas is likewise provided to enhance thethermal conductivity between substrate table 301 and substrate 309. Inthis embodiment of the invention, thermal assembly 311 includes aplurality of thermoelectric modules such as, for example, Peltiermodules.

In the embodiment of the invention represented in FIG. 3, the RF poweris directly supplied to the upper body of substrate table 301 via an RFassembly including RF cable 312, RF feeder 313 and RF connector 314.Although not shown in FIG. 3, RF cable 312 may be connected to an RFpower generator and an RF match circuit. In FIG. 3, the RF assemblyextends through first and second thermal assemblies, 302 and 311, inorder to deliver the RF power close to thermal surface 308 wheresubstrate 309 is disposed.

FIG. 4 illustrates an apparatus including an RF power assembly accordingto another embodiment of the invention. Similarly to FIG. 3, apparatus400 includes a substrate table 401 in which a first thermal assembly 402and a second thermal assembly 411 are arranged. Apparatus 400 alsoincludes thermal surface 408, which supports substrate 409, and gas lineassembly 416 that provides backside pressure to substrate 409. In FIG.4, the gas lines of the gas line assembly 416 are disposed between theplurality of thermoelectric modules 415 of the second thermal assembly411 and channel 404. In this embodiment of the invention, substrate 409is mechanically clamped to the thermal surface with clamping assembly417. Apparatus 400 further includes an RF power assembly including RFconnector 414 coupled to RF power plate 418. In the embodiment of theinvention shown in FIG. 4, the RF plate is arranged between first andsecond thermal assemblies, 402 and 411. In this configuration, thematerial constituting RF power plate 418 is selected so as not to form athermal barrier to second thermal assembly 411. In another embodiment,power plate 418 may be disposed underneath second thermal assembly 411.In the embodiment of the invention represented in FIG. 4, placing andremoving substrate 409 is done by pins 419 arranged in substrate table401 and through first and second thermal assemblies 402 and 411.

Referring now to FIG. 5, an exemplary embodiment of a substrateprocessing system capable of controlling the temperature of a substrateduring substrate processing will now be explained.

Substrate processing system 500 includes vacuum chamber 520 in whichsubstrate table 501 is arranged. Similarly to the embodiment shown inFIG. 4, substrate table 501 includes first thermal assembly 502, secondthermal assembly 511 and thermal surface 508, on which substrate 509 isdisposed. Substrate processing system 500 further includes a movingassembly 521, configured to vertically move substrate table 501 withinprocessing chamber 520, and pumping system 522 constructed and arrangedto maintain a desired pressure inside chamber 520. In the embodimentillustrated in FIG. 5, second thermal assembly 511 may be identical tothermal assembly 311 shown in FIG. 3 and may include a plurality ofthermoelectric modules such as, for example, Peltier devices, which areconfigured to quickly change the temperature of thermal surface 508. InFIG. 5, thermal assembly 502 includes channel 504, which carries aheat-transfer fluid and which is in fluid communication with fluidthermal unit 503. In this embodiment of the invention, the temperatureof the heat-transfer fluid within channel 504 and/or conduits 506 and507 is controlled by fluid thermal unit 503. In another embodiment ofthe invention, second thermal assembly 511 may include a resistiveheater connected to a variable power source. In either embodiment,heating or cooling is achieved by direct thermal conduction, from thethermoelectric modules, or the resistive heater, to thermal surface 508,via first thermal assembly 511.

It should be understood that channel 504 that carries the heat-transferfluid may have different shapes. In an embodiment of the invention,channel 504 has a spiral shape and is designed to thermally cover asubstantial area of thermal surface 508. This embodiment of theinvention is depicted in FIG. 6, which represents a schematic top viewof channel 504 embedded within substrate table 501. As can be seen inthis figure, channel 504 includes inlet 523 and outlet 524 that are influid communication with fluid thermal unit 503 through conduits 506 and507. In FIGS. 5 and 6, location of the channel 504 relative to thermalsurface 508 is such that efficient heat transfer to and uniformtemperature distribution on the thermal surface can be achieved. In anembodiment of the invention, the distance separating channel 504 fromthermal surface 508 is in the range of approximately 1 to 30 mm.

It should also be understood that substrate processing system 500 shownin FIG. 5 may be a plasma processing system, an etch system, a ChemicalVapor Deposition (CVD) system, a plasma enhanced chemical vapordeposition (PECVD) system, a Physical Vapor Deposition (PVD) system, anionized physical vapor deposition (iPVD) system, or a non-plasmaprocessing system such as a track system, a chemical oxide removal (COR)system, or more generally, any type of system in which it is desirableto control the temperature of the substrate during substrate processing.In a plasma processing configuration, for example, substrate processingsystem 500 may include a plasma generating system and a gas sourceconfigured to introduce gas into chamber 520 for creating a processingplasma. In operation, substrate 509 may be clamped to substrate table501 via an electrostatic, a suction or a mechanical device. Generally,for chemical and/or plasma processing, substrate table 501 and substrate509 are placed in chamber 520, where a reduced pressure is attained viapumping system 522. Although not shown in the embodiment represented inFIG. 5, substrate processing system 500 may also include additionalprocess gas lines entering processing chamber 520, a Radio Frequency(RF) power system, a second electrode (that could be used for acapacitively-coupled type system) or an RF coil (that could be used foran inductively coupled type system).

During processing of substrate 509, adjustment and control of thetemperature of the thermal surface may be achieved via wafer temperaturemeasurement system (or sensor) 525 arranged in chamber 520. In anembodiment of the invention, temperature measurements of substrate 509are taken by wafer temperature measurement system 525 and input intowafer temperature control system 526. In case the temperature needs tobe adjusted, control system 526 commands the fluid thermal unit 503 toadjust the temperature, volume and flow rate of the heat-transfer fluidsupplied to channel 504. As can be seen in FIG. 5, measurements of thetemperature of substrate 509 may be performed using optical techniques,such as an optical fiber thermometer commercially available fromAdvanced Energies, Inc. (1625 Sharp Point Drive, Fort Collins, Colo.,80525), Model No. OR2000F capable of measurements from 50 to 2000 C andan accuracy of plus or minus 1.5 C, or a band-edge temperaturemeasurement system as described in pending U.S. patent application Ser.No. 10/168,544, filed on Jul. 2, 2002, the contents of which areincorporated herein by reference in their entirety. In anotherembodiment of the invention, measurements of the substrate temperaturemay be done with thermocouples 527 embedded in various parts ofsubstrate table 501. In this latter configuration, the thermocouples maybe directly connected to substrate temperature control system 526. Inyet another embodiment of the invention, the control of the temperatureof substrate 509 may be done by monitoring the temperature of the fluidvia a temperature probe 528 embedded within channel 504 and/or conduits506 and 507 and coupled to the temperature control system 526. In thislatter scenario, the temperature control system 526 may directlyestimate the temperature of the substrate 509 via the temperatureprovided by probe 528. It should be understood that any combination ofthese sensors can be employed to control the temperature of the thermalsurface.

As can also be seen in FIG. 5, temperature control system 526 may alsobe configured to control second thermal assembly 511. In case secondthermal assembly includes a resistive heater or a plurality ofthermoelectric modules, temperature control system 526 may directly becoupled to a power source PS that supplies second thermal assembly 511with the required power.

Referring now to FIG. 7, a schematic representation of a fluid thermalunit according to an embodiment of the invention will now be described.

In this embodiment of the invention, fluid thermal unit 703 includes afirst fluid unit 729 (or a first source of heat-transfer fluid)constructed and arranged to control/adjust the temperature of theheat-transfer fluid to a first temperature and a second thermal unit 730(or a second source of heat-transfer fluid) constructed and arranged tocontrol/adjust the temperature of the heat-transfer fluid to a secondtemperature. This second temperature may be equal to or different fromthe first temperature. Fluid thermal unit 703 further includes an outletflow control unit 731 which is in fluid communication with the channelof the thermal assembly through conduit 707, and with first and secondfluid units 729 and 730. In the embodiment of the invention shown inFIG. 7, outlet flow control unit 731 is constructed and arranged tosupply the channel of the thermal assembly with a controlledheat-transfer fluid including at least one of the heat-transfer fluidhaving a first temperature, the heat-transfer fluid having a secondtemperature or a combination thereof. In an embodiment of the invention,outlet flow control unit 731 may control the flow rate and volume ofcontrolled heat-transfer fluid supplied to the thermal assembly inaccordance with the instructions received from the temperature controlsystem. In the embodiment of the invention illustrated in FIG. 7, fluidthermal unit 703 further includes an inlet distribution unit 732 that isin fluid communication with the channel of the thermal assembly throughconduit 706 and with the first and second fluid units 729 and 730. Inletdistribution unit 732 is constructed and arranged to control a volume orflow rate of controlled heat transfer fluid flowing to the first fluidunit 729 and a volume or flow rate of controlled heat transfer fluidflowing to the second fluid unit 730.

Referring now to FIG. 8, each of the first and second fluid units 729and 730, according to an embodiment of the invention, includes a storagefluid tank, 833 a and 833 b, a pump, 834 a and 834 b, a heater, 835 aand 835 b, and a cooler, 836 a and 836 b. Storage fluid tanks 833 a and833 b are configured to store the controlled heat-transfer fluid flowingfrom the inlet distribution unit. Units 729 and 730 may also include, inan embodiment of the invention, level sensors that are configured todetect a volume of heat-transfer fluid in each of these tanks. Theheaters and the coolers are configured to adjust the temperature of theheat-transfer fluid stored in tanks 833 a and 833 b to a firsttemperature and to a second temperature respectively. The pumps 834 aand 834 b supply the outlet flow control unit with the heat-transferfluid having a first temperature and with the heat-transfer fluid havinga second temperature. In an embodiment of the invention, storage fluidtank 833 a-b, pump 834 a-b, heater 835 a-b and cooler 836 a-b, may becontrolled by the temperature control system.

In an embodiment of the invention, it may be desirable that theheat-transfer fluid include electrically non-conductive liquids such as,for example, Fluorinert™ or Galden™. In that way, the heat-transferfluid will not be conductive in the presence of the radio-frequencypower supplied to the substrate table to generate the plasma.

In an embodiment of the invention, the first fluid unit may be a hotfluid unit 929 while the second fluid unit may be a cold fluid unit 930or vice versa. In such a configuration, it may be possible to suppressthe cooler in the first fluid unit and the heater in the second fluidunit (or vice versa). This embodiment of the invention is schematicallyrepresented in FIG. 9.

In the embodiment of the invention shown in FIG. 7, the outlet flowcontrol unit 731 and the inlet distribution unit 732 may be operatedindependently of each other. In such a configuration, the volume ofheat-transfer fluid leaving the first and second fluid units may bedifferent from the volume of controlled heat-transfer fluid returning tothese units. In an embodiment of the invention, the volume ofheat-transfer fluid returning to the first unit may be much larger thanthe volume of heat-transfer fluid returning to the second unit. In thisway, a large volume of fluid having a first temperature may readily beavailable for future use. Such a regime of operation may be advantageousto anticipate large temperature changes (in a cooling phase or a heatingphase). In this mode of operation, it may be possible to provide fasterheating of the substrate during a heating phase. Conversely, it may bepossible to store large volumes of heat-transfer fluid in the secondunit in anticipation of a cooling phase.

It should be understood, however, that the outlet flow control unit 731and the inlet distribution unit 732 may also be operated in acooperative relationship. Such a parallel mode of operation isschematically illustrated in FIG. 10, which represents a schematicconfiguration of the fluid thermal unit 1003. In this embodiment of theinvention, the amount of fluid leaving the first and second fluid units,1029 and 1030, is substantially the same as the amount of fluidreturning to these units.

In another embodiment of the invention, the fluid thermal unit isconfigured such that the amount of heat-transfer fluid in each of theunits remains substantially constant. In this configuration, the inletdistribution unit may be omitted. This mode of operation of the fluidthermal unit is illustrated in FIG. 11.

The outlet flow control unit represented in the different embodiments ofthe present invention may include a mixer that is configured to supplythe channel with a controlled heat transfer fluid including one of theheat-transfer fluid having a first temperature, the heat transfer fluidhaving a second temperature or a combination thereof. In this embodimentof the invention, the mixer may include a mixing tank and a mixingdevice configured to mix the heat-transfer fluid having a firsttemperature with the heat-transfer fluid having a second temperature. Inanother embodiment of the invention, the mixer 1231 may include a pump1237 and a mixing flow chamber 1238 having a mixing flow surface 1239.In this embodiment of the invention, the heat-transfer fluid having afirst temperature and the heat-transfer fluid having a secondtemperature are directed to a chamber similar to the one illustrated inFIG. 12. Mixing of the two fluids is performed in this embodiment bymechanical mixing within the mixing flow chamber 1238.

In another embodiment of the invention, the outlet flow control unit mayinclude selector valves that are configured to selectively send theheat-transfer fluid having the first temperature and the heat-transferfluid having a second temperature. This embodiment of the invention isrepresented in FIG. 13, which depicts a fluid thermal unit 1303including first and second fluid units 1329 and 1330. In FIG. 13, fluidthermal unit 1303 includes an outlet flow control unit 1331 comprising afirst outlet selector valve 1340 and a second outlet selector valve1341. Fluid thermal unit 1303 also includes an inlet distribution unit1332 comprising a first inlet selector valve 1342 and a second inletselector valve 1343. In this embodiment of the invention, the first andsecond outlet selector valves and the first and second inlet selectorvalves control the flow of heat-transfer fluid in and out of units 1329and 1330.

In operation, the inlet and outlet valves may be operated independentlyfrom each other or in a cooperative relationship. This latterconfiguration, illustrated in FIG. 14, may ensure that the amount ofheat-transfer fluid remains substantially the same in the fluid thermalunits 1329 and 1330. In another embodiment of the invention, fluid units1329 and 1330 may be designed such that they can only contain a constantand specified amount of heat-transfer fluid. In such a case, the inletdistribution unit may be omitted. This embodiment of the invention isshown in FIG. 15.

Operation of the thermal unit according to an embodiment of theinvention will now be explained.

In case the temperature of the controlled heat-transfer fluid lays inthe range between T3 and T4, where T3>T4, the first fluid unit of thefluid thermal unit may then set the first temperature to T1≧T3 while thesecond fluid unit may set the second temperature to T2≦T4. During theinitial stage of a heating phase, the outlet flow control unit may beconfigured to supply the thermal assembly with the heat-transfer fluidhaving the first temperature T1. This may allow for a faster heating ofthe substrate. Then, when the temperature of the substrate gets closerto the aimed temperature T3, the outlet flow control unit may becontrolled to slowly release the heat-transfer fluid having the secondtemperature T2 (or a mixture of these two fluids). In such a mode ofoperation, it may be possible to rapidly change the temperature of thethermal surface while providing at the same time a smooth transitionbetween the actual temperature of the thermal surface and the targettemperature.

In the cooling phase, the thermal unit may be operated in a similarmanner. That is, the outlet flow control unit may be configured tosupply the thermal assembly with the heat-transfer fluid having a secondtemperature T2 during the initial stage of the cooling process. Withthis mode of operation, it may be possible to quickly reach the targettemperature T4. Then, when the substrate temperature gets closer to thetarget temperature, the outlet flow control unit of the fluid thermalunit may slowly start supplying the thermal assembly with theheat-transfer fluid having the first temperature T1 (or with a mixtureof these fluids). In this way, it may be possible to rapidly change thetemperature of the thermal surface while providing at the same time asmooth transition between the actual temperature of the thermal surfaceand the target temperature.

In order to obtain faster temperature changes, the fluid thermal unitmay, in an embodiment of the invention, be configured to overheat and/orovercool the heat-transfer fluid. In this embodiment of the invention,the overheated fluid has a temperature T1>T3, and the overcooled fluidhas a temperature T2<T4. The larger the difference is between T1 and T3,the faster heating will occur. Similarly, the larger the difference isbetween T2 and T4, the faster cooling will occur.

In anticipation of a heating phase, the fluid thermal unit may beconfigured, in an embodiment of the invention, to store large amounts ofheat-transfer fluid in the storage tank of the first fluid unit. Thestorage of heat-transfer fluid having a first temperature (hottemperature in the present case) would be done at the expense of thestorage tank of the second fluid unit. In this embodiment of theinvention, a larger amount of hot heat-transfer fluid (i.e.heat-transfer fluid having a first temperature) may be useful to providefaster heating of the substrate, especially when the thermal mass of thesubstrate table is significant.

A similar approach may be pursued in anticipation of a cooling phase. Inthat case, the fluid thermal unit may be configured to store a largeramount of heat-transfer fluid in the second fluid unit (that works incooling mode).

In another embodiment of the invention, the fluid thermal unit may beconfigured to provide faster heating/cooling by increasing the flow rateof the controlled heat-transfer fluid supplied to the channel. In thismode of operation, a steeper heating or cooling front may be obtained.

It should be understood that the different elements of the fluid thermalunit may be controlled by the temperature control system. Thistemperature control system may include electronic/computer units thatcontrol the different parts of the outlet flow control unit, the inletdistribution unit and the first and second fluid units on the basis ofdata collected by temperature probes. The temperature control system mayalso be configured, in an embodiment of the invention, to directlymonitor the temperature of the heat-transfer fluid in the first andsecond thermal units. In another embodiment of the invention, thetemperature control system may be configured to read executableinstructions of a programmed process scenario (of temperaturevariation).

FIG. 16 shows a schematic representation of a distributed temperaturecontrol system 1600 according to an embodiment of the invention. In thisembodiment of the invention, the distributed temperature control systemis configured to control a temperature of a plurality of equipments suchas, for example, substrate tables.

Referring now in more detail to FIG. 16, distributed system 1600includes a fluid thermal unit 1603 that is constructed and arranged toadjust a temperature of the heat-transfer fluid supplied to each of theequipment 1601 a, 1601 b and 1601 c. Each of these equipment is in fluidcommunication with the thermal unit 1603 via conduits 1606 a-c and 1607a-c and via channels 1604 a-c disposed within the equipment. In thisembodiment of the invention, heating of each of these equipment is doneby thermal conduction from the heat-transfer fluid via channels 1604a-c.

As can be seen in FIG. 16, fluid thermal unit 1603 includes a firstfluid unit 1629 constructed and arranged to control the temperature ofthe heat-transfer fluid to a first temperature and a second fluid unit1630 constructed and arranged to control the temperature of theheat-transfer fluid to a second temperature. Fluid thermal unit 1603also includes an outlet flow control unit 1631 that is in fluidcommunication with the first and second fluid units 1629 and 1630, andwith the channels 1604 a-c of each of the equipment 1601 a-c. In thisembodiment of the invention, the outlet flow control unit 1631 isconstructed and arranged to supply the channel of each of theseequipment with a controlled heat transfer fluid including at least oneof the heat-transfer fluid having a first temperature, the heat transferfluid having a second temperature or a combination thereof.

In the embodiment of the invention shown in FIG. 16, fluid thermal unit1603 also includes an inlet distribution unit 1632 that is in fluidcommunication with the first and second fluid units 1629 and 1630 andwith each of the channels 1604 a-c. In particular, the inletdistribution unit 1632 is constructed and arranged to control a volumeof controlled heat transfer fluid flowing to the first fluid unit and avolume of controlled heat transfer fluid flowing to the second fluidunit.

The distributed temperature control system 1600 enables one toefficiently control a temperature of each of these equipment. Inoperation, the fluid thermal unit 1603 may be coupled to a temperaturecontrol system, which may be similar to the one represented in theembodiment of the invention shown in FIG. 5. Temperature measurementstaken by the temperature measurement system may be input into thetemperature control system which in turn may direct the thermal unit tosupply each of the channels with a controlled heat-transfer fluid havingan appropriate temperature. In this way, it may be possible toindependently control each of these equipment.

In an embodiment of the invention, the fluid thermal unit 1603 may belocated outside a clean room. In another embodiment of the invention,only the fluid unit acting as the refrigerating unit may be locatedoutside the clean room and/or apart from the other fluid unit. Theseconfigurations may be desirable when the type of refrigeration used tocool the heat-transfer fluid and the conditions of the clean room arenot compatible.

While a detailed description of presently preferred embodiments of theinvention have been given above, various alternatives, modifications,and equivalents will be apparent to those skilled in the art withoutvarying from the spirit of the invention. Therefore, the abovedescription should not be taken as limiting the scope of the invention,which is defined by the appended claims.

1. A distributed temperature control system for controlling atemperature of a substrate, comprising: a substrate table having athermal surface for supporting said substrate; a plurality of thermalassemblies arranged in said substrate table and in thermal communicationwith said thermal surface, each of said plurality of thermal assembliescomprising a channel that carries heat transfer fluid; and a fluidthermal unit constructed and arranged to adjust a temperature of saidheat-transfer fluid, said fluid thermal unit comprising: a first fluidunit constructed and arranged to control the temperature of saidheat-transfer fluid to a first temperature; a second fluid unitconstructed and arranged to control the temperature of said heattransfer fluid to a second temperature; and an outlet flow control unitthat is in fluid communication with each channel of said plurality ofthermal assemblies and said first and second fluid units, said outletflow control unit being constructed and arranged to supply each channelwith a controlled heat transfer fluid comprising at least one of theheat-transfer fluid having a first temperature, the heat transfer fluidhaving a second temperature or a combination thereof.
 2. The distributedtemperature control system of claim 1, wherein said outlet flow controlunit comprises a mixing unit, said mixing unit comprises a mixing flowchamber having a mixing flow surface, and wherein the heat-transferfluid having said first temperature and the heat transfer fluid havingsaid second temperature are mechanically mixed within said mixing flowchamber.
 3. The distributed temperature control system of claim 1,further comprising: an inlet distribution unit that is in fluidcommunication with each channel of said plurality of thermal assembliesand said first and second fluid units, said inlet distribution unitbeing constructed and arranged to control a volume, a flow rate, orcombination thereof of controlled heat transfer fluid flowing to saidfirst fluid unit and a volume, a flow rate, or combination thereof ofcontrolled heat transfer fluid flowing to said second fluid unit.
 4. Thedistributed temperature control system of claim 1, wherein said outletflow control unit is in a cooperative relationship with said inletdistribution unit such that a volume of heat-transfer fluid located ineach of said first and second fluid units is substantially constant. 5.The distributed temperature control system of claim 1, wherein each ofthe first and second fluid units comprises a storage fluid tank, a pump,a heater and a cooler.
 6. The distributed temperature control system ofclaim 1, further comprising: a temperature control system constructedand arranged to control a supply of the controlled heat-transfer fluidbased upon a temperature of one of the substrate surface, the thermalsurface, and the controlled heat-transfer fluid in at least one channelof said plurality of thermal assemblies.
 7. The distributed temperaturecontrol system of claim 1, further comprising: a temperature sensorconstructed and arranged to detect a temperature of one of the substratesurface, the thermal surface, and the controlled heat-transfer fluid inat least one channel of said plurality of thermal assemblies.
 8. Thedistributed temperature control system of claim 1, wherein one of saidfirst fluid unit and said second fluid unit is located remotely fromsaid substrate table.
 9. The distributed temperature control system ofclaim 1, further comprising: a resistive heater in thermal communicationwith the thermal surface.
 10. The distributed temperature control systemof claim 1, further comprising: an electrode arranged in said substratetable and configured to electro-statically clamp said substrate to saidthermal surface of said substrate table; and a gas conduit passingthrough said substrate table and having a first end open to said thermalsurface and a second end opposite said first end such that a gas canflow through said conduit and provide backside pressure to saidsubstrate.
 11. The distributed temperature control system of claim 10,further comprising: a resistive heater arranged in said substrate tableand in thermal communication with the thermal surface.
 12. Thedistributed temperature control system of claim 1, further comprising:an RF power plate arranged in said substrate table and an RF powerconnector that connects the RF power plate to an RF power supply. 13.The distributed temperature control system of claim 1, wherein saidthermal surface comprises a substantially planar surface.
 14. Adistributed temperature control system for controlling a temperature ofa substrate, comprising: a substrate table having a thermal surface forsupporting said substrate; a plurality of thermal assemblies arranged insaid substrate table and in thermal communication with said thermalsurface, each of said plurality of thermal assemblies comprising achannel that carries heat transfer fluid; and a plurality of fluidthermal units, wherein each of said plurality of fluid thermal units isindependently constructed and arranged to adjust a temperature of saidheat-transfer fluid to one of said plurality of thermal assemblies, andwherein each of said plurality of fluid thermal units comprises: a firstfluid unit constructed and arranged to control the temperature of saidheat-transfer fluid to a first temperature; a second fluid unitconstructed and arranged to control the temperature of said heattransfer fluid to a second temperature; and an outlet flow control unitthat is in fluid communication with said channel of said one of saidplurality of thermal assemblies and said first and second fluid units,said outlet flow control unit being constructed and arranged to supplysaid channel of said one of said plurality of thermal assemblies with acontrolled heat transfer fluid comprising at least one of theheat-transfer fluid having a first temperature, the heat transfer fluidhaving a second temperature or a combination thereof.
 15. Thedistributed temperature control system of claim 14, wherein said outletflow control unit comprises a mixing unit, said mixing unit comprises amixing flow chamber having a mixing flow surface, and wherein theheat-transfer fluid having said first temperature and the heat transferfluid having said second temperature are mechanically mixed within saidmixing flow chamber.
 16. The distributed temperature control system ofclaim 14, wherein each of said plurality of fluid thermal units furthercomprises: an inlet distribution unit that is in fluid communicationwith said channel of said one of said plurality of thermal assembliesand said first and second fluid units, said inlet distribution unitbeing constructed and arranged to control a volume, a flow rate, orcombination thereof of controlled heat transfer fluid flowing to saidfirst fluid unit and a volume, a flow rate, or combination thereof ofcontrolled heat transfer fluid flowing to said second fluid unit. 17.The distributed temperature control system of claim 14, wherein saidthermal surface comprises a substantially planar surface.
 18. A methodof controlling a temperature of a substrate supported by a thermalsurface of a substrate table, the substrate table including a fluidthermal assembly in thermal communication with the thermal surface, themethod comprising: adjusting a heat-transfer fluid of a first source ofheat-transfer fluid to a first temperature; adjusting a heat-transferfluid of a second source of heat-transfer fluid to a second temperature;supplying said fluid thermal assembly with a controlled heat-transferfluid comprising the heat transfer fluid from said first source for afirst period of time; and supplying said fluid thermal assembly withanother controlled heat-transfer fluid comprising a combination of theheat transfer fluid from said first source and the heat transfer fluidfrom said second source for a second period of time.
 19. The method ofclaim 18, further comprising: adjusting an amount of the heat transferfluid from said first source relative to another amount of the heattransfer fluid from said second source.
 20. The method of claim 18,wherein said first temperature is greater than said second temperaturewhen heating said substrate.
 21. The method of claim 18, wherein saidfirst temperature is less than said second temperature when cooling saidsubstrate.
 22. The method of claim 18, further comprising: heating saidsubstrate using a resistive heater.
 23. The method of claim 18, furthercomprising: clamping said substrate to said thermal surface of saidsubstrate table; and providing a backside pressure to said substrate byflowing a gas to a backside of said substrate.
 24. The method of claim18, further comprising: mixing the heat transfer fluid from said firstsource and the heat transfer fluid from said second source whensupplying another controlled heat-transfer fluid comprising thecombination of the heat transfer fluid from said first source and theheat transfer fluid from said second source.
 25. A method of controllinga temperature profile of a substrate supported by a thermal surface of asubstrate table, the substrate table including a plurality of fluidthermal assemblies in thermal communication with the thermal surface,the method comprising: adjusting a heat-transfer fluid of a first sourceof heat-transfer fluid to a first temperature; adjusting a heat-transferfluid of a second source of heat-transfer fluid to a second temperature;supplying each of said plurality of fluid thermal assemblies with acontrolled heat-transfer fluid comprising the heat transfer fluid fromsaid first source for a first period of time; and supplying each of saidplurality of fluid thermal assemblies with a controlled heat-transferfluid comprising a combination of the heat transfer fluid from saidfirst source and the heat transfer fluid from said second source for asecond period of time.
 26. The method of claim 25, further comprising:adjusting an amount of the heat transfer fluid from said first sourcerelative to another amount of the heat transfer fluid from said secondsource for each of said plurality of fluid thermal assemblies.
 27. Amethod for processing a substrate within a plasma processing system, theplasma processing system comprising: a substrate table having a thermalsurface for supporting said substrate; a thermal assembly arranged insaid substrate table and in thermal communication with said thermalsurface, the thermal assembly comprising a channel that carries a heattransfer fluid, and a fluid thermal unit constructed and arranged toadjust a control temperature of said heat-transfer fluid, said fluidthermal unit comprising: a first fluid unit constructed and arranged tocontrol the temperature of said heat-transfer fluid to a firsttemperature; a second fluid unit constructed and arranged to control thetemperature of said heat transfer fluid to a second temperature; anoutlet flow control unit that is in fluid communication with saidchannel of said thermal assembly and said first and second fluid units,said outlet flow control unit being constructed and arranged to supplysaid channel with a controlled heat transfer fluid at said controltemperature comprising at least one of the heat-transfer fluid havingsaid first temperature, the heat transfer fluid having said secondtemperature or a combination thereof, wherein said outlet flow controlunit comprises a mixing unit, said mixing unit comprises a mixing flowchamber having a mixing flow surface, and wherein the heat-transferfluid having said first temperature and the heat transfer fluid havingsaid second temperature are mechanically mixed within said mixing flowchamber; an inlet distribution unit that is in fluid communication withsaid channel of said plurality of thermal assemblies and said first andsecond fluid units, said inlet distribution unit being constructed andarranged to control a volume, a flow rate, or combination thereof ofcontrolled heat transfer fluid flowing to said first fluid unit and avolume, a flow rate, or combination thereof of controlled heat transferfluid flowing to said second fluid unit; and a plurality of temperaturesensors operatively coupled to a temperature control system to report atleast a temperature of said thermal surface or said substrate, maintainan optimized temperature profile at a desired temperature of saidsubstrate disposed on said thermal surface, the method comprising:setting said first temperature; setting said second temperature, whereinsaid first temperature is greater than said second temperature; settinga first control temperature of said controlled heat transfer fluid bysetting a first flow rate of said heat transfer fluid at said firsttemperature and setting a first flow rate of said heat transfer fluid atsaid second temperature; mixing said first flow rate of said heattransfer fluid at said first temperature and said first flow rate ofsaid heat transfer fluid at said second temperature; supplying saidcontrolled heat transfer fluid at said first control temperature to saidthermal assembly; and processing said substrate during said supply ofsaid controlled heat transfer fluid at said first control temperature tosaid thermal assembly.
 28. The method of claim 27, further comprising:adjusting said first control temperature.
 29. The method of claim 27,further comprising: setting a second control temperature of saidcontrolled heat transfer fluid by setting a second flow rate of saidheat transfer fluid at said first temperature and setting a second flowrate of said heat transfer fluid at said second temperature; mixing saidsecond flow rate of said heat transfer fluid at said first temperatureand said second flow rate of said heat transfer fluid at said secondtemperature; supplying said controlled heat transfer fluid at saidsecond control temperature to said thermal assembly; and processing saidsubstrate during said supply of said controlled heat transfer fluid atsaid second control temperature to said thermal assembly.
 30. The methodof claim 29, further comprising: adjusting said second controltemperature.